HMDS(Electronic Grade)

Brand: ZJSEB™

Purity: ≥99.90%

CAS No. : 999-97-3

Appearance: Colorless transparent liquid
Company type:  Manufacturer || Worldwide Exporter
Mini Order Quantity:  Usually 1 FCL
Supply Ability:  400tons || Month
Main Uses: Semiconductor Lithography || Dielectric Layer Formation|| CVD in Electronics

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1000-3999 kilograms >= 1FCL

to be updated

Product Detail:

Description

Implementation standard: T/FSI004-2016

Alternative Names: Hexamethyldisilazide (amine) ; Bis(trimethylsilyl)amine ; HMDS

Related Research：HMDS in semiconductor manufacturing；HMDS for wafer surface treatment；Electronic grade HMDS specifications；HMDS alternatives for microelectronics；HMDS safety and handling in semiconductor fabs

Uses&benefits

Semiconductor Lithography

Dielectric Layer Formation

CVD in Electronics

Silicon Wafer Processing

Benefits：

Used as an adhesion promoter for photoresists in the semiconductor photolithography process.
Enhances the precision of pattern transfer, reduces defects, and improves the yield in the production of semiconductor devices. The high purity ensures minimal contamination in sensitive microelectronic components.

Benefits：

Acts as a precursor for depositing dielectric films in advanced semiconductor fabrication processes.
Ensures excellent electrical insulation properties, reduces leakage currents, and supports the miniaturization of electronic components.

Benefits：

Used in the deposition of thin silicon-based films during CVD (Chemical Vapor Deposition) processes in microelectronics and integrated circuit manufacturing.
Enhances the uniformity and stability of thin films, crucial for the performance and longevity of electronic devices. The 99.9% purity minimizes contamination and defects in sensitive applications.

Benefits：

Used for wafer surface treatment to enhance cleanliness and prevent contamination during semiconductor manufacturing.
Provides superior wafer quality, ensures defect-free surfaces, and increases the reliability of high-performance semiconductor devices.

Specification

Item	Index
Appearance	Colorless transparent liquid
Assay	≥99.9%
Refractive index (25°）	1.4060-1.4100
Density	0.770-0.780
Free available chlorine	≤2 ppm
Metal ions	<5 ppb
Water	<50 ppm
Particle 0.5um	<50

Packing & Delivery

Plastic bucket Net weight: 150KG Gross weight: 160KG

Iron drum Net weight: 150KG Gross weight: 171.5KG

Company Profile

Zhejiang Sorbo Chemical Co., Ltd. was founded in 2007. It has a registered capital of CNY 46 million, a total asset of CNY 200 million, and currently more than 120 employees. Our factory covers 26,680 square metres. It is located at No. 6 Erbei Road, Juhua Factory, Intelligent Manufacturing New City Industrial Park, Quzhou City, Zhejiang Province. It is on the south side of Logistics Avenue and close to Hangjin-Quzhou Expressway and Hangzhou-Ningbo Expressway.

Know More >

We research, develop, produce and sell high-tech silicone products like hexamethyldisilazane and hexamethyl disiloxane. Our products are used in medicine, liquid silicone rubber and semiconductors. Our company has obtained more than 50 patents since it was set up. We also have ISO9001, ISO14001, ISO45001 and IP management system certifications. Our products are exported worldwide and are well-known in the industry.

In the future, our company will focus on developing high-tech silicone products. Our development is based on integrity, efficiency, technology, and quality. We aim to provide products that satisfy users and fulfil our commitments to them. We invite experts and scholars to visit and provide guidance, and we hope to cooperate with friends to create a grand plan.

Certificates & Honors

※ IS0 9001:2015
※ IS0 45001:2018
※IS0 14001:2015

※ISO/IEC 20000-1:2018
※ National high-tech enterprises
※Tax Credit Grade A
※ Environmental protection credit rating A

※Innovative Enterprise in Fluorosilicon Industry

Payments

Accepted Payment Currency:USD,EUR,RMB;
Accepted Payment Type: T/T,L/C,D/P D/A,PayPal,Western Union,Cash;

1000-3999 kilograms >= 1FCL

to be updated

Semiconductor Lithography

Dielectric Layer Formation

CVD in Electronics

Silicon Wafer Processing

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